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Plasma Monitoring

Plasma Monitoring with Modular, High-resolution Spectroscopy

A modular spectrometer based on a high-resolution spectrometer is used to monitor changes in plasma emissions when different gases are introduced into the plasma chamber.
Measurement is carried out in a sealed reaction chamber, and is combined with a spectrometer, Optical Fiber (+ capable of supplying and manufacturing Optics products tailored to the measurement system) to be measured and monitored through a small viewport outside the chamber or a vacuum feedthrough inside the chamber.
These measurements demonstrated the possibility of a modular spectroscopic component for obtaining plasma emission spectra in real time in the plasma chamber. Plasma characteristics determined in the emission spectrum can be used for monitoring and controlling plasma-based processes.

 

• Monitor the optical emission from the plasma using the High Resolution spectroscope.

• The plasma spectrum has an emission peak according to each characteristic, each of which can detect changes in atoms in the plasma so that it can monitor when etch transitions from one layer to another.

• Real-time monitoring within the chamber also provides useful information for a holistic view of the processing environment and proactive identification of potential issues

• Plasma can be monitored using the OES principle, and the user can monitor the desired endpoint point in real time to determine when to stop Etching.

• Plasma Process Monitoring

- Detect any changes or fault in a plasma process
- Stability without change

 

Real Time Measure Repeatability

Repeated real-time measurement of wide spectrum plasma emission enables quick overall understanding of the plasma process

High Resolution, High Speed, High Sensitivity Spectrometer

Rapid acquisition of accurate and reliable measurement results and wide spectral data through the use of high-resolution spectroscopy.

Customized Optical Products

Establish a stable system by performing equipment configuration optimized for the system through customization

Software

Customized software for control and monitoring of plasma processes, from plasma analysis to generation of databases of measurement data can be produced

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